Gaois

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  1. EDUCATION AND COMMUNICATIONS|information technology and data processing · INDUSTRY|electronics and electrical engineering|electronics industry · PRODUCTION, TECHNOLOGY AND RESEARCH

    #677625

    IATE #1112029
    EUV-Lithografie | EUV-Lithographie
    de
    Definition Fotolithografie-Verfahren, das elektromagnetische Strahlung mit einer Wellenlänge von 13,5 nm (91,82 eV) nutzt, sogenannte extrem ultraviolette Strahlung (englisch extreme ultra violet, EUV), und das es ermöglicht, nach Ausreizen bisheriger Belichtungsmethoden die Strukturverkleinerung in der Halbleiterindustrie fortzusetzen, um kleinere, effizientere und schnellere integrierte Schaltkreise herstellen zu können Reference "Wikipedia EUV-Lithografie (13.5.2025)"
    EUV lithography | extreme ultraviolet lithography | EUVL
    en
    Definition "advanced photolithography technique used in semiconductor chip production, employing 13.5 nm extreme ultraviolet light, to create finer patterns on wafers, enabling the manufacture of microchips with nodes smaller than 7 nanometers" Reference "Council-Terminology Coordination, based on: - Aliya Farook Badiuddin, What Is EUV Lithography? (18.10.2024) AZoNano, September 20, 2024; - “Extreme ultraviolet lithography”, (18.10.2024) Wikipedia; - TJ Porter, What Is EUV, and How Does It Work? (18.10.2024) Investopedia, October 27, 2023."
    Comment This concept is significant in the EU context, as the Dutch company ASML holds a near-monopoly in the production of EUV lithography machines, which are essential for manufacturing the most advanced microchips with node sizes as small as 7, 5, and 3 nanometers.
    lithographie par EUV | lithographie par rayonnement ultraviolet extrême | lithographie EUV | lithographie par ultraviolets extrêmes | lithographie extrême ultraviolet
    fr
    Definition "technique de photolithographie avancée utilisée afin de fabriquer des semi-conducteurs plus performants par la miniaturisation grâce à un rayon ultraviolet extrême de 13,5 nanomètres" Reference "Conseil-FR, d'après:- Communication de la Commission européenne intitulée «Action européenne sur les semi-conducteurs» – COM(2022) 45 final- Les Échos du 20.5.2019, article de Pauline Houédé, «Puces: les défis technologiques de la lithographie extrême ultraviolet» (28.10.2024)"