#3082845
Gaireas le haghaidh deascadh fisiceach trí spriúchadh ar shliseoga leathsheoltóra
Apparatus for physical deposition by sputtering on semiconductor wafers
Gaireas le haghaidh deascadh fisiceach trí spriúchadh ar shliseoga leathsheoltóra
Apparatus for physical deposition by sputtering on semiconductor wafers
Páirteanna de ghaireas le haghaidh deascadh fisiceach trí spriúchadh ar shliseoga leathsheoltóra, nó le haghaidh táirgeadh leathsheoltóra
Parts of apparatus for physical deposition by sputtering on semiconductor wafers, or for semiconductor production
(Nóta: Is gnáthmhodhnuithe ar an bpróiseas iad spriúchadh trióide, maighnéatróin nó radaimhinicíochta chun greamaitheacht an bhrataithe agus an ráta deasctha a mhéadú.).
(Note: Triode, magnetron or radio frequency sputtering to increase adhesion of coating and rate of deposition are ordinary modifications of the process.).
Chun críoch X.B.I.001.b.1, is éard atá sa ‘spriúchadh’ próiseas brataithe forleagain ina ndéantar iain a bhfuil lucht deimhneach iontu a luathú le réimse leictreach, i dtreo dromchla sprice (ábhar brataithe).
For the purpose of X.B.I.001.b.1, “sputtering” is an overlay coating process wherein positively charged ions are accelerated by an electric field towards the surface of a target (coating material).